Y. Ichikawa et al., Effects of partial oxygen pressure on the crystal growth of PbTiO3 thin films on miscut (001)SrTiO3, VACUUM, 59(2-3), 2000, pp. 417-423
Single crystal PbTiO3 (PT) thin films were epitaxially grown on a miscut (0
0 1)SrTiO3 (ST) substrate by magnetron sputtering at different partial oxy
gen pressures, At a low partial oxygen pressure, continuous PT thin films w
ere grown under a step-flow growth. At a high partial oxygen pressure, the
PT thin films showed an island structure. The partial oxygen pressure affec
ted the film growth mode and modified the strain distribution of the result
ant sputtered PT thin films. (C) 2000 Elsevier Science Ltd. All rights rese
rved.