TwinMag II: Improving an advanced sputtering tool

Recent changes in the principle design of MF powered double magnetron catho des has lead to two major advances; higher target utilization and increased stabilization of the reactive gas discharge. The stock of the target mater ial was expanded by increasing the width of the target from 100 to 240 mm. The new target width enabled a design modification of the magnetic field. T he erosion profile has changed to be shallow, compared to the standard magn etron cathode and offered a total target utilization of 35-40%. The stabili zation of the reactive plasma discharge, at the operation point, offered ex cellent film properties (structure, density, optical characteristics) at hi gh deposition rates. TiO2 was deposited at a 3-5 times and SnO2 at a 2 time s higher deposition rate than a conventional DC magnetron. A simple method for controlling the oxygen partial pressure was developed based on a reliab le gas sensor. Oxygen flow is maintained at a constant level while the cath ode power is adjusted to fix an operation point close to the "metallic mode ". (C) 2000 Elsevier Science Ltd. All rights reserved.