Development of a locally electron-heated plasma source

A new type high-density plasma source has been developed. It employs a 2.45 -GHz microwave in combination with permanent magnets which surround microwa ve ports located in the chamber sidewall. Electron-cyclotron resonance regi ons are formed locally in front of the microwave ports. High-energy electro ns are produced which diffuse into the center of the chamber along the line s of magnetic force. A cusp magnetic field is employed to confine the plasm a. An ion saturation current density of 20 mA cm(-2) within a uniformity of 5% over a 300 mm diameter is obtained. (C) 2000 Elsevier Science Ltd. All rights reserved.