Magnetron sputtering cathode with confined magnetic flux

Citation
R. Ai et al., Magnetron sputtering cathode with confined magnetic flux, VACUUM, 59(2-3), 2000, pp. 466-471
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
VACUUM
ISSN journal
0042207X → ACNP
Volume
59
Issue
2-3
Year of publication
2000
Pages
466 - 471
Database
ISI
SICI code
0042-207X(200011/12)59:2-3<466:MSCWCM>2.0.ZU;2-R
Abstract
In a planar magnetron cathode, a disk target shows an erosion ring at the c entral region of the target. It was found that the grounded permalloy sheet which covered the outer surface of the magnetron cathode confined the magn etic leakage flux and enhanced the transverse magnetic field at the outer r egion of the target. The additional erosion ring was observed at the outer region. The total amount of the sputtered substance increased by 4 times. T he grounded permalloy sheet will provide a compact magnetron cathode with a controlled erosion pattern. (C) 2000 Elsevier Science Ltd. All rights rese rved.