A batch photoreactor was used to evaluate the UV/H2O2 oxidation process for
the removal of humic acids in water. A 450-W UV lamp with high-pressure me
rcury vapor was employed as the light source. The residues of humic acids a
nd hydrogen peroxide were measured for assessment of process performance an
d understanding of process reaction behavior. The UV photolysis alone can p
lay an important role in the degradation of humic acids. The presence of hy
drogen peroxide was found to promote the degradation efficiency. However, e
xcessive dosage of H2O2 does not further improve the degradation of humic a
cids. On the contrary, the lower the H2O2 dosage the higher the amount of h
umic acids which can be removed. Aeration with air does not favor the remov
al efficiency of humic acids as the oxidation lasts for a sufficiently long
time. The presence of carbonate species deteriorates the humic acids' remo
val, whereas it results in a larger amount of H2O2 decomposition. (C) 2000
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