Metal deposition on n-Si(111): H electrodes

Authors
Ziegler, JC Reitzle, A Bunk, O Zegenhagen, J Kolb, DM
Citation
Jc. Ziegler et al., Metal deposition on n-Si(111): H electrodes, ELECTR ACT, 45(28), 2000, pp. 4599-4605
Citations number
31
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHIMICA ACTA
ISSN journal
00134686 → ACNP
Volume
45
Issue
28
Year of publication
2000
Pages
4599 - 4605
Database
ISI
SICI code
0013-4686(2000)45:28<4599:MDONHE>2.0.ZU;2-R
Abstract
Well-defined monohydride-terminated n-Si(111) electrodes were used to study electrodeposition of Pb and Cu as well as electroless Au deposition on the se surfaces. With classical electrochemical methods, in-situ STM, ex-situ A FM, SEM and in-situ SXRD, the initial stages of metal deposition and the ep itaxial properties of the metal deposit were investigated. (C) 2000 Elsevie r Science Ltd. All rights reserved.