Formation and corrosion of InP/In contacts in hydrochloric acid

Citation
Aw. Hassel et al., Formation and corrosion of InP/In contacts in hydrochloric acid, ELECTR ACT, 45(28), 2000, pp. 4673-4682
Citations number
21
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHIMICA ACTA
ISSN journal
00134686 → ACNP
Volume
45
Issue
28
Year of publication
2000
Pages
4673 - 4682
Database
ISI
SICI code
0013-4686(2000)45:28<4673:FACOIC>2.0.ZU;2-V
Abstract
Flatband potentials, charge carrier concentrations and their frequency disp ersions of p-type and n-type InP in 1.0 M HCl were determined. The cathodic decomposition of InP in this acidic solution is compared with the depositi on process of indium from 1.0 M-HCl containing 0.1 M InCl3, The share of th e involved reactions, hydrogen evolution, InP decomposition and indium depo sition are investigated. The reaction rates are generally smaller on p-type InP and the reaction speed is much slower but the principal reactions are the same. The kinetics of the indium deposition and dissolution are studied in detail. These reactions are discussed in terms of the preparation of wa tersplitting photoelectrodes with modified surfaces. (C) 2000 Elsevier Scie nce Ltd. All rights reserved.