Electron impact ionization and ion chemistry in trimethylaluminum and in trimethylgallium

Citation
Cq. Jiao et al., Electron impact ionization and ion chemistry in trimethylaluminum and in trimethylgallium, INT J MASS, 202(1-3), 2000, pp. 345-349
Citations number
15
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY
ISSN journal
13873806 → ACNP
Volume
202
Issue
1-3
Year of publication
2000
Pages
345 - 349
Database
ISI
SICI code
1387-3806(20001016)202:1-3<345:EIIAIC>2.0.ZU;2-V
Abstract
Ionization of trimethylaluminum and trimethylgallium by electron impact fro m threshold to 70 eV and the gas-phase reactions of the resulting ions with their parent molecules are studied by using Fourier transform mass spectro metry. The total ionization cross sections rise from thresholds near 10 eV to 1.3 +/- 0.1 x 10(-15) and 1.2 +/- 0.1 x 10(-15) cm(2), respectively, at no eV. The most abundant product ions of dissociative ionization are M(CH3) (2)(+) (M = Al or Ga). Most of the ions generated by the electron impact io nization except M(CH3)(2)(+) and M+ react readily with the parent molecules yielding M(CH3)(2)(+) and M+ as the principal product ions, with rate coef ficients of (2-6) x 10(-10) cm(3) s(-1). Clusters with two metal atoms were observed with relatively small branching ratios or reaction rates. (Int J Mass Spectrom 202 (2000) 345-349) (C) 2000 Elsevier Science B.V.