INTERFERENCE EFFECTS IN BRAGG-CASE SYNCHROTRON SECTION TOPOGRAPHY OF ELASTICALLY BENT SILICON IMPLANTED CRYSTALS

White-beam synchrotron section topography was applied to a silicon cry stal implanted with 4.8 MeV alpha-particles elastically bent with the radius of curvature close to 100 m. A number of section patterns corre sponding to different reflections was analysed. It was found that the section pattern in the bent sample was drastically different from thos e observed in a flat sample. The difference consists in the occurrence of the sets of additional interference fringes covering a long distan ce up to several millimetres behind the main diffraction maximum. It w as possible to reproduce some characteristic features of the fringes b oth in the implanted and non-implanted region by numerical integration of the Takagi-Taupin equation.