HIGH-RESOLUTION X-RAY-DIFFRACTION INVESTIGATION OF CRYSTAL PERFECTIONAND RELAXATION OF GAAS INGAAS/GAAS QUANTUM-WELLS DEPENDING ON MOVPE GROWTH-CONDITIONS/

Citation
U. Zeimer et al., HIGH-RESOLUTION X-RAY-DIFFRACTION INVESTIGATION OF CRYSTAL PERFECTIONAND RELAXATION OF GAAS INGAAS/GAAS QUANTUM-WELLS DEPENDING ON MOVPE GROWTH-CONDITIONS/, Nuovo cimento della Societa italiana di fisica. D, Condensed matter,atomic, molecular and chemical physics, biophysics, 19(2-4), 1997, pp. 369-376
Citations number
7
Categorie Soggetti
Physics
ISSN journal
03926737
Volume
19
Issue
2-4
Year of publication
1997
Pages
369 - 376
Database
ISI
SICI code
0392-6737(1997)19:2-4<369:HXIOCP>2.0.ZU;2-B
Abstract
The influence of growth conditions and the concentration of indium in the vapour phase on the crystal perfection of strained InGaAs/GaAs qua ntum wells grown by metalorganic vapour phase epitaxy is studied by hi gh-resolution X-ray diffraction, cathodoluminescence, photoluminescenc e and transmission electron microscopy. A strong dependence of the mis fit dislocation density on the growth temperature is found. With incre asing In concentration in the vapour phase a transition to the 3-dimen sional growth mode leading to a different type of defect formation is observed.