Evolution of the surface roughness (dynamic scaling) and microstructure ofsputter-deposited Ag75Co25 granular films

Citation
Rm. Oksuzoglu et al., Evolution of the surface roughness (dynamic scaling) and microstructure ofsputter-deposited Ag75Co25 granular films, J PHYS-COND, 12(44), 2000, pp. 9237-9245
Citations number
27
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS-CONDENSED MATTER
ISSN journal
09538984 → ACNP
Volume
12
Issue
44
Year of publication
2000
Pages
9237 - 9245
Database
ISI
SICI code
0953-8984(20001106)12:44<9237:EOTSR(>2.0.ZU;2-I
Abstract
X-ray specular-reflectivity measurements have been carried out on Ag75Co25 granular films which were sputter-deposited on Si substrates with SiO2 surf ace, to investigate the evolution of surface roughness as a function of fil m thickness. X-ray reflectivity data were recorded for thicknesses of Ag75C o25 thin films ranging from 8.8-116.9 nm. A power law behaviour of the inte rfacial width of a growing interface in sputtered-deposited Ag75Co25 granul ar films was observed. The scaling exponent was found to be beta = 0.43 +/- 0.01 and compared with theoretical calculations. High resolution electron microscopy revealed the presence of crystalline particles of fee Ag and hcp Co. The structural and magnetoresistive properties of the films are discus sed.