Properties of boron nitride (BxNy) films produced by the spin-coating process of polyborazine

Citation
Jg. Kho et al., Properties of boron nitride (BxNy) films produced by the spin-coating process of polyborazine, J AM CERAM, 83(11), 2000, pp. 2681-2683
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
ISSN journal
00027820 → ACNP
Volume
83
Issue
11
Year of publication
2000
Pages
2681 - 2683
Database
ISI
SICI code
0002-7820(200011)83:11<2681:POBN(F>2.0.ZU;2-N
Abstract
Boron-rich boron nitride (BN) films have been prepared on Si and SiO2/Si su bstrates by the vacuum pyrolysis of spin-coated polyborazine films. physica l properties of the prepared films such as film strength, thermal conductiv ity, and dielectrics were determined. The BN films vacuum-pyrolyzed at 900 degreesC showed residual N-H bonds with a 0.75 N/B ratio, interdiffusion ph enomena, and preferred orientation at the interfacial zone. Hardness and th e elastic modulus of the film increased to 1.6 GPa and 50 GPa by nanoindent ation loading. It had a thermal conductivity of 134 W/(m.K) at 296.5 K, and a dielectric constant in the range of 5-7, with tan partial derivative bet ween 0.01 and 0.47, depending on the film thickness.