A new self-consistent hole mobility model that includes the lattice and the
hole temperature has been proposed. By including the lattice and hole temp
eratures as well as the effective transverse field and the interface Bred c
harge, the model predicts the saturation of the hole drift velocity and sho
ws the effects of Coulomb scattering, surface phonon scattering, and surfac
e roughness scattering. The model has been incorporated into a device simul
ation program, SNU-2D. The simulation results have been compared with the r
eported experimental data and the measured 0.1 mum pMOSFETs, and they are s
hown to agree quite well. The new model is expected to estimate the charact
eristics of very short-channel devices in the hydrodynamic model simulation
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