A. Refke et al., RETENTION AND EROSION BEHAVIOR OF OXYGEN-IMPLANTED IN DIFFERENT SI C-MATERIALS/, Journal of nuclear materials, 241, 1997, pp. 1103-1109
Citations number
13
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
Different Si/C-material like plasma deposited thin a-Si/C:H films, bul
k Si doped graphites (SiC30) and pure silicon have been irradiated wit
h an oxygen ion beam of the isotope O-18 at energies between 1 and 5 k
eV and at target temperatures up to 1700 K. The release of oxygen and
oxygen containing molecules during irradiation and during subsequent t
hermal desorption has been analyzed by means of quadrupole mass spectr
ometry in both the residual gas and direct 'line-of-sight' detection,
All investigated materials show an enhanced oxygen retention compared
to pure graphite and a markedly reduced chemical erosion in the form o
f CO and CO2 depending on the silicon content of the sample. Furthermo
re, the oxygen impact onto such substrates gives rise to a build up of
a silicon oxide layer at the near surface. This leads to an additiona
l release of SiO during irradiation at elevated temperatures as well a
s during subsequent thermal desorption.