Y. Ito et al., SPECTROSCOPIC MEASUREMENT OF KINETIC-ENERGY OF SPUTTERED BORON IN ELECTRON-CYCLOTRON-RESONANCE PLASMA, Journal of nuclear materials, 241, 1997, pp. 1122-1126
Citations number
9
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
A new diagnostic method for measurement of the kinetic energy of sputt
ered boron in plasma using spectroscopic technique has been developed.
Boron is sputtered by plasma ions produced by electron cyclotron reso
nance discharge, Line emissions from the borons are measured in direct
ions both parallel and perpendicular to the boron moving axis using a
compact monochromator. Observed emission profiles an analyzed by means
of non-linear least square fitting and E-peak, at which the resultant
profile h(M)(E-z) has a peak value, is inferred, where surface bindin
g energy U-s, is nearly equal to 4 x E-peak. The values E-peak of the
boron sputtered by helium, neon, and argon ions with energy of 2 keV a
re 1.5-2.0 eV, 0.95-1.3 eV and 1.5-1.7 eV, respectively.