Synthesis and resist evaluation of photosensitive polyimides

We have synthesized novel photodegradable polyimides with sulfonyloxyimide units in the polymer main chain. The yield and molecular weight of polyimid es were significantly influenced by polymerization condition and monomer st ructure. The prepared polyimides were stable up to 300 degreesC. The effect s of polymer structure on photodegradable characteristics were examined. Th e photodegradation of polyimides upon irradiation with deep UV resulted fro m scission of N-O bonds or ling opening of imide moiety. The polyimides are useful as positive working photodegradable polymers. Especially, it has be en found that the positive tone image of polyimide derived from pyromelliti c dianhydride units has high sensitivity and resolution.