High Tg polyarylate thin films for photonic device applications

Citation
O. Sugiwara et al., High Tg polyarylate thin films for photonic device applications, MOLEC CRYST, 349, 2000, pp. 111-114
Citations number
3
Categorie Soggetti
Physical Chemistry/Chemical Physics
Volume
349
Year of publication
2000
Pages
111 - 114
Database
ISI
SICI code
Abstract
Polyarylates (PARs) with high glass transition temperature (Tg) are used fo r photonic device applications. Optical properties are investigated, and it indicates that the PARs show high thermal stability as well as high optica l transparency. Electron-beam lithography can be performed using the PAR th in films, and high resolution surface relief gratings are fabricated by dir ect electron-beam writing technique together with thermal development.