Refractive index modification due to the UV-photodecomposition of polysilane and its application as phase mask

Authors
Nagayama, N Shimono, M Sato, T Yokoyama, M
Citation
N. Nagayama et al., Refractive index modification due to the UV-photodecomposition of polysilane and its application as phase mask, MOLEC CRYST, 349, 2000, pp. 119-122
Citations number
3
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
MOLECULAR CRYSTALS AND LIQUID CRYSTALS → ACNP
Volume
349
Year of publication
2000
Pages
119 - 122
Database
ISI
SICI code
Abstract
The development of phase mask using the refractive index variation due to t he UV-photodecomposition of the polysilane was examined. It was proven that the refractive index due to the UV-photodecomposition of the poly[methyl(p henyl)silane] changed from 1.70 to 1.56 by means of the ellipsometry measur ements. Furthermore, it was confirmed that information of the phase differe nce could be recorded by providing the pattern of the UV photodecomposition of the polysilane.