AlGaN/GaN strained layer superlattices have been employed in the cladding l
ayers of InGaN multi-quantum well laser diodes grown by metalorganic chemic
al vapor deposition (MOCVD). Superlattices have been investigated for strai
n relief of the cladding layer, as well as an enhanced hole concentration,
which is more than ten times the value obtained for bulk AlGaN films. Laser
diodes with strained layer superlattices as cladding layers were shown to
have superior structural and electrical properties compared to laser diodes
with bulk AlGaN cladding layers. As the period of the strained layer super
lattices is decreased, the threshold voltage, as well as the threshold curr
ent density, is decreased. The resistance to vertical conduction through p-
type superlattices with increasing superlattice period is not offset by the
increase in hole concentration for increasing superlattice spacing, result
ing in higher voltages.