Integration of PLZT and BST family oxides with GaN.

Citation
Av. Osinsky et al., Integration of PLZT and BST family oxides with GaN., MRS I J N S, 5, 2000, pp. NIL_105-NIL_110
Citations number
4
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH
ISSN journal
10925783 → ACNP
Volume
5
Year of publication
2000
Supplement
1
Pages
NIL_105 - NIL_110
Database
ISI
SICI code
1092-5783(2000)5:<NIL_105:IOPABF>2.0.ZU;2-9
Abstract
Recent advances in the processing of complex-oxide materials has allowed us to monolithically grow ferroelectrics of lead lanthanum zirconate titanate (PLZT) and barium strontium titanate (BST) systems on a GaN/sapphire struc ture. High quality films of PLZT and BST were grown on GaN/c-Al2O3 in a thi ckness range of 0.3-5 mum by a sol-gel technique. Field-induced birefringen ce, as large as 0.02, was measured from a PLZT layer grown on a buffered Ga N/sapphire structure. UV illumination was found to result in more symmetric al electrooptic hysteresis loop. BST films on GaN demonstrated a low freque ncy dielectric constant of up to 800 with leakage current density as low as 5.5-10(-8) A/cm(2).