The nature and impact of ZNO buffer layers on the initial stages of the hydride vapor phase epitaxy of GAN

Citation
Sl. Gu et al., The nature and impact of ZNO buffer layers on the initial stages of the hydride vapor phase epitaxy of GAN, MRS I J N S, 5, 2000, pp. NIL_124-NIL_129
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH
ISSN journal
10925783 → ACNP
Volume
5
Year of publication
2000
Supplement
1
Pages
NIL_124 - NIL_129
Database
ISI
SICI code
1092-5783(2000)5:<NIL_124:TNAIOZ>2.0.ZU;2-P
Abstract
The nature and impact of ZnO buffer layers on the initial stages of the hyd ride vapor phase epitaxy (HVPE) of GaN have been studied by xray photoelect ron spectroscopy (XPS), atomic force microscopy (AFM), xray diffraction (XR D) and photoluminescence (PL). During pre-growth heating, the surface ZnO l ayer was found to both desorb from ZnO-coated sapphire and react with the u nderlying sapphire surface forming a thin ZnAl2O4 alloy layer between ZnO a nd sapphire surface. This ZnO-derived surface promotes the initial nucleati on of the GaN and markedly improves material surface morphology, quality an d growth reproducibility.