MOVPE growth of quaternary (Al,Ga,In)N for UV optoelectronics

Citation
J. Han et al., MOVPE growth of quaternary (Al,Ga,In)N for UV optoelectronics, MRS I J N S, 5, 2000, pp. NIL_353-NIL_364
Citations number
33
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH
ISSN journal
10925783 → ACNP
Volume
5
Year of publication
2000
Supplement
1
Pages
NIL_353 - NIL_364
Database
ISI
SICI code
1092-5783(2000)5:<NIL_353:MGOQ(F>2.0.ZU;2-G
Abstract
We report the growth and characterization of quaternary AlGalnN. A combinat ion of photoluminescence (PL), high-resolution x-ray diffraction (XRD), and Rutherford backscattering spectrometry (RBS) characterizations enables us to explore the contours of constant- PL peak energy and lattice parameter a s functions of the quaternary compositions. The observation of room tempera ture PL emission at 351nm (with 20% Al and 5% In) renders initial evidence that the quaternary could be used to provide confinement for GaInN land pos sibly GaN). AlGaInN/GaInN MQW heterostructures have been grown; both XRD an d PL measurements suggest the possibility of incorporating this quaternary into optoelectronic devices.