Structural and electronic properties of line defects in GaN

Citation
J. Elsner et al., Structural and electronic properties of line defects in GaN, MRS I J N S, 5, 2000, pp. NIL_413-NIL_423
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH
ISSN journal
10925783 → ACNP
Volume
5
Year of publication
2000
Supplement
1
Pages
NIL_413 - NIL_423
Database
ISI
SICI code
1092-5783(2000)5:<NIL_413:SAEPOL>2.0.ZU;2-9
Abstract
We present density-functional theory based studies for several types of lin e defects in both hexagonal and cubic GaN. (10-10) type surfaces play an im portant role in hexagonal GaN since similar configurations occur at open-co re screw dislocations and nanopipes as well as at the core of threading edg e dislocations. Except for full-core screw dislocations which possess heavi ly strained bonds all investigated stoichiometric extended defects in hexag onal GaN do not induce deep acceptor states in the band-gap and thus cannot be responsible for the yellow luminescence. However, electrically active p oint defects in particular gallium vacancies and oxygen related defect comp lexes are found to be trapped at the stress field of the dislocations. Prel iminary calculations for cubic GaN find the ideal stoichiometric 60 degrees -dislocations to be electrically active. As in hexagonal material, vacanci es and impurities like oxygen are likely to be trapped at the dislocation c ore.