Lattice location of deuterium in plasma and gas charged Mg doped GaN

Citation
Wr. Wampler et al., Lattice location of deuterium in plasma and gas charged Mg doped GaN, MRS I J N S, 5, 2000, pp. NIL_475-NIL_480
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH
ISSN journal
10925783 → ACNP
Volume
5
Year of publication
2000
Supplement
1
Pages
NIL_475 - NIL_480
Database
ISI
SICI code
1092-5783(2000)5:<NIL_475:LLODIP>2.0.ZU;2-K
Abstract
We have used ion channeling to examine the lattice configuration of deuteri um in Mg doped GaN grown by MOCVD. The deuterium is introduced by exposure to gas phase or ECR plasmas. A density functional approach including lattic e relaxation, was used to calculate total energies for various locations an d charge states of hydrogen in the wurtzite Mg doped GaN lattice. Results o f channeling measurements are compared with channeling simulations for hydr ogen at lattice locations predicted by density functional theory.