Optical properties of AlGaN quantum well structures
Citation
H. Hirayama et al., Optical properties of AlGaN quantum well structures, MRS I J N S, 5, 2000, pp. NIL_598-NIL_603
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH
SICI code
1092-5783(2000)5:<NIL_598:OPOAQW>2.0.ZU;2-C
Abstract
We demonstrate 230-250 nm efficient ultraviolet (UV) photoluminescence (PL)
from AlN(AlGaN)/AlGaN multi-quantum-wells (MQWs) fabricated by metalorgani
c vapor-phase-epitaxy (MOVPE). Firstly, we show the PL properties of high A
l content AlGaN bulk (Al content: 85-95%) emitting from near band-edge. We
systematically investigated the PL properties of AlGaN-MQWs consisting of w
ide bandgap AlGaN (Al content: 53-100%) barrier. We obtained efficient PL e
mission of 234 and 245 nm from AlN/A(0.18)Ga(0.82)N and Al0.8Ga0.2N/Al0.18G
a0.82N MQWs, respectively, at 77 K. The optimum value of well thickness was
approximately 1.5 nm. The emission from the AlGaN MQWs were several tens o
f times stronger than that of bulk AlGaN. We found that the most efficient
PL is obtained at around 240 nm from AlCaN MQWs with Al0.8Ga0.2N barriers.
Also, we found that the PL from AlGaN MQW is as efficient as that of InGaN
QWs at 77 K.