Emission at 247 nm from GaN quantum wells grown by MOCVD

Citation
T. Someya et al., Emission at 247 nm from GaN quantum wells grown by MOCVD, MRS I J N S, 5, 2000, pp. NIL_846-NIL_850
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH
ISSN journal
10925783 → ACNP
Volume
5
Year of publication
2000
Supplement
1
Pages
NIL_846 - NIL_850
Database
ISI
SICI code
1092-5783(2000)5:<NIL_846:EA2NFG>2.0.ZU;2-C
Abstract
Photoluminescence (PL) spectra were measured at room temperature for GaN qu antum wells (QWs) with Al0.8Ga0.2N barriers, which were grown by atmospheri c-pressure metal organic chemical vapor deposition (MOCVD). The thickness o f the GaN QW layers was systematically varied from one monolayer to four mo nolayers. We clearly observed a PL peak at a wavelength as short as 247 nm (5.03 eV) from one monolayer-thick QWs. The effective confinement energy is as large as 1.63 eV.