Gjm. Hagelaar et Gmw. Kroesen, A Monte Carlo modelling study of the electrons in the microdischarges in plasma addressed liquid crystal displays, PLASMA SOUR, 9(4), 2000, pp. 605-614
Fluid models for gas discharges are based on restrictive assumptions for th
e electron-energy distribution function (EEDF). In this work we investigate
the validity and consequences of these assumptions for discharges occurrin
g in plasma addressed liquid crystal (PALC) displays. For this purpose we h
ave developed a Monte Carlo model for electrons, which we compare to a flui
d model. A direct current (DC) discharge and afterglow in the PALC geometry
are considered, with helium as a discharge gas. In the discharge, the EEDF
calculated with the Monte Carlo model displays several non-equilibrium phe
nomena. such as peaks of fast electrons that have undergone none or only a
few collisions, and the absence of a high-energy tail. Although these featu
res are not incorporated in the fluid model, both models lead to virtually
the same electron density profile. However, the ionization rate obtained wi
th the Monte Carlo model is spread out over a larger region than the ioniza
tion rate in the fluid model. The Monte Carlo calculations reveal that the
electrons in the afterglow have a highly non-equilibrium nature, and requir
e a special treatment in the fluid model.