A Monte Carlo modelling study of the electrons in the microdischarges in plasma addressed liquid crystal displays

Citation
Gjm. Hagelaar et Gmw. Kroesen, A Monte Carlo modelling study of the electrons in the microdischarges in plasma addressed liquid crystal displays, PLASMA SOUR, 9(4), 2000, pp. 605-614
Citations number
23
Categorie Soggetti
Physics
Journal title
PLASMA SOURCES SCIENCE & TECHNOLOGY
ISSN journal
09630252 → ACNP
Volume
9
Issue
4
Year of publication
2000
Pages
605 - 614
Database
ISI
SICI code
0963-0252(200011)9:4<605:AMCMSO>2.0.ZU;2-S
Abstract
Fluid models for gas discharges are based on restrictive assumptions for th e electron-energy distribution function (EEDF). In this work we investigate the validity and consequences of these assumptions for discharges occurrin g in plasma addressed liquid crystal (PALC) displays. For this purpose we h ave developed a Monte Carlo model for electrons, which we compare to a flui d model. A direct current (DC) discharge and afterglow in the PALC geometry are considered, with helium as a discharge gas. In the discharge, the EEDF calculated with the Monte Carlo model displays several non-equilibrium phe nomena. such as peaks of fast electrons that have undergone none or only a few collisions, and the absence of a high-energy tail. Although these featu res are not incorporated in the fluid model, both models lead to virtually the same electron density profile. However, the ionization rate obtained wi th the Monte Carlo model is spread out over a larger region than the ioniza tion rate in the fluid model. The Monte Carlo calculations reveal that the electrons in the afterglow have a highly non-equilibrium nature, and requir e a special treatment in the fluid model.