Laser-induced formation of polymers from unsaturated (organyl)trimethylsilanes in the gas phase

ArF laser irradiation into gaseous trimethyl(propynyloxy)silane, trimethyl( ethenoxy)silane and trimethyl(ethynyl)silane results in chemical vapour dep osition of thin films of solid organosilicon polymers. UV excitation of the two former compounds leads to polymerization at the triple bond as a major process to yield, respectively, saturated poly(trimethylsilyloxyhydrocarbo n) and poly(trimethylsilylhydrocarbon), whereas that of the latter compound is controlled by cleavage reactions to afford poly(methylsiloxane). The pr ocesses represent a unique photopolymerization in the absence of photoiniti ators. (C) 2000 Elsevier Science Ltd. All rights reserved.