Niobium nitride/aluminium nitride multilayers have been fabricated usi
ng dc reactive magnetron sputter deposition. By careful optimization a
suitable set of deposition conditions has been achieved under which b
oth high quality superconducting and insulating layers may be fabricat
ed. This has allowed automation of the deposition process to fabricate
multilayers by simple computer control of substrate position and shut
tering. Deposition onto a range of single crystal and amorphous substr
ates has given a range of different crystal structures. We have measur
ed the transport properties of these multilayers as a function of supe
rconductor and insulator layer thickness in order to study the interla
yer coupling, and have fabricated stacked superconductor - insulator -
superconductor junctions.