Growth of rhenium oxide thin films

Citation
Mg. Krishna et Ak. Bhattacharya, Growth of rhenium oxide thin films, SOL ST COMM, 116(11), 2000, pp. 637-641
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
116
Issue
11
Year of publication
2000
Pages
637 - 641
Database
ISI
SICI code
0038-1098(2000)116:11<637:GOROTF>2.0.ZU;2-K
Abstract
Rhenium oxide thin films have been grown on stainless steel substrates by D C magnetron sputtering. The stainless steel substrates were biased between -50 and -150 V, and the growth was followed by means of specular reflectanc e and the derived refractive index and optical absorption. It is shown that the reflectance is a strong function of the bias voltage. There is an init ial decrease in the reflectance at -50 V and with further increase in bias voltage there is an increase in reflectance. The refractive index of the fi lms at 600 nm was 2.30 +/- 0.02, independent of the biasing conditions, but the optical absorption decreased with increase in bias voltage. The absorp tion features and the variation in the colour of the films from golden brow n to red suggest that the films are mainly ReO3 with some oxygen non-stoich iometry. (C) 2000 Elsevier Science Ltd. All rights reserved.