A new era for high-current, low-energy ion implantation

Citation
Tm. Parrill et al., A new era for high-current, low-energy ion implantation, SOL ST TECH, 43(11), 2000, pp. 103
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X → ACNP
Volume
43
Issue
11
Year of publication
2000
Database
ISI
SICI code
0038-111X(200011)43:11<103:ANEFHL>2.0.ZU;2-S
Abstract
for high-current ion implantation, energy reduction is the critical technol ogy process trend, and it presents fundamental process and equipment design challenges. Effectively transporting low-energy energy ions is only one as pect of the challenge, though, because new process equipment must work in n ew fabs with higher demands for process control, productivity, and reliabil ity.