G. Padeletti et al., Evaluation of structural and adhesive properties of nylon 6 and PTFE alignment films by means of atomic force microscopy, APPL PHYS A, 71(5), 2000, pp. 571-576
Atomic force microscopy (AFM) has become a powerful technique for submicron
investigation of surface properties. In this work we use the capability of
this technique to investigate dielectric films used to align ferroelectric
liquid crystals (FLC). In fact, the final performance of a surface stabili
zed FLC (SSFLC) Rat panel display strongly depends on the alignment layer p
roperties and quality. This work focuses on a comparison of two alignment f
ilms: the more conventional polyamide, nylon 6, and polytetrafluoroethilene
(PTFE, commercially known as Teflon), only recently used as a new aligning
material.
A micromorphological characterization of the sample surfaces has been carri
ed out in order to correlate structure with alignment properties of both po
lymer films. The results show varying roughness and periodicity wavelengths
for the two alignment layers. These different properties can be related to
different anchoring forces between aligning surfaces and FLC molecules and
therefore to a different electrooptical response of SSFLC cells. In additi
on to the topographic characterization, AFM non-conventional measurements h
ave been performed on alignment layers deposited on different transparent c
onductive oxides, such as indium tin oxide (ITO) and SnO2, used to make ele
ctrodes in SSFLC displays. These measurements provide local information on
the adhesive properties of the studied alignment. materials as a function o
f substrate coating. These observations indicate less adhesion of PTFE with
respect to nylon 6.