Nonlinear thickness dependence of two-photon absorptance in Al2O3 films

Citation
O. Apel et al., Nonlinear thickness dependence of two-photon absorptance in Al2O3 films, APPL PHYS A, 71(5), 2000, pp. 593-596
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
71
Issue
5
Year of publication
2000
Pages
593 - 596
Database
ISI
SICI code
0947-8396(200011)71:5<593:NTDOTA>2.0.ZU;2-1
Abstract
Linear and nonlinear absorptance in Al2O3 films of different optical thickn esses are investigated using an ArF laser calorimeter. While the linear abs orptance at 193 nm shows the expected linear increase, nonlinear absorptanc e increases quadratically with increasing film thickness. Thus, it cannot b e described by a constant nonlinear absorption coefficient beta. The experi mental findings are explained by a simple phenomenological approach using e xcited states with a finite interaction length longer than the actual film thickness, a new material constant Gamma is introduced, which describes the nonlinear absorptance behavior correctly.