Enhancement of the thermal stability of magnetic tunnel junctions employing artificial ferrimagnets

Citation
T. Dimopoulos et al., Enhancement of the thermal stability of magnetic tunnel junctions employing artificial ferrimagnets, APPL PHYS L, 77(22), 2000, pp. 3624-3626
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
22
Year of publication
2000
Pages
3624 - 3626
Database
ISI
SICI code
0003-6951(20001127)77:22<3624:EOTTSO>2.0.ZU;2-Q
Abstract
We have fabricated magnetic tunnel junctions that use Co/Ru/Co and Co/Ru/Co 50Fe50 artificial ferrimagnet (AFi) systems as hard magnetic electrodes and AlOx as tunnel barrier. The thermal behavior of the two AFis, incorporated in tunnel junctions, presents dramatic differences, the most remarkable be ing the much greater thermal stability of the Co/Ru/CoFe system. This stems from the improvement of the interfaces the CoFe alloy forms with its adjac ent Ru and AlOx layers. After successive annealing steps up to 400 degreesC , junctions incorporating the Co/Ru/CoFe system still present a significant tunnel magnetoresistance signal of nearly 20%, and most importantly, an al most intact magnetic rigidity of the hard magnetic system, being very promi sing for spin-electronic devices. (C) 2000 American Institute of Physics. [ S0003-6951(00)02048-9].