Multiple sharp peaks were observed in the visible photoluminescence spectra
of amorphous silicon thin films, prepared by ultrahigh vacuum electron cyc
lotron resonance chemical vapor deposition on oxidized silicon substrates.
The angular dependence of the photoluminescence, measured by a home-built f
iber-optics device, revealed that the origin of these sharp features was du
e to Fabry-Perot cavity interference effects. The interference is enhanced
by deposition on thermally grown oxide layers with relatively smooth surfac
es. We also consider how thin-film interference effects can add to the alre
ady existing confusion regarding the photoluminescence (PL) mechanism of po
rous and other luminescent forms of silicon and propose angle-dependent PL
spectroscopy as a remedy for identifying spectral features due to interfere
nce effects. (C) 2000 American Institute of Physics. [S0003-6951(00)00247-3
].