Diamond anvils with diamond encapsulated thin-film microcircuits have been
fabricated for ultrahigh pressure electrical conductivity experiments. The
diamond films were homoepitaxially deposited onto the diamond anvil substra
tes with microwave plasma chemical vapor deposition using a 2% methane in h
ydrogen gas mixture and a diamond substrate temperature of 1300 degreesC. T
he diamond embedded thin-film microprobes remain functional to megabar pres
sures. We have applied this technology to the study of the pressure-induced
metallization of KI under pressures up to 1.8 Mbar. This technology has th
e potential of greatly advancing the pressure range of a number of existing
high-pressure diagnostic techniques, and for expanding the capabilities of
diamond anvil cells into new directions. (C) 2000 American Institute of Ph
ysics. [S0003-6951(00)00347-8].