Switching stability of magnetic tunnel junctions with an artificial antiferromagnet

Citation
J. Schmalhorst et al., Switching stability of magnetic tunnel junctions with an artificial antiferromagnet, APPL PHYS L, 77(21), 2000, pp. 3456-3458
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
21
Year of publication
2000
Pages
3456 - 3458
Database
ISI
SICI code
0003-6951(20001120)77:21<3456:SSOMTJ>2.0.ZU;2-I
Abstract
Avoiding fatigue in the switching of magnetic tunnel junctions is crucial f or their long-term use in nonvolatile magnetic memories. We compare the swi tching stability of two types of junctions with different soft layers: Fe o r Ni81Fe19, both with Co dusting at the barrier interface. The magnetically hard electrode is a Co/Cu/Co artificial antiferromagnet. While the tunneli ng magnetoresistance (TMR) remains unchanged after 10(4) cycles in a 4 kA/m rotating field, it decreases by more than 45% due to uniaxial switching. F ringing fields of domain walls in the soft layer and an intrinsic instabili ty of Co/Cu/Co are identified as the main reasons. Magnetization reversal b y two perpendicular switching pulses avoids this magnetic degradation and m aintains a full TMR signal. (C) 2000 American Institute of Physics. [S0003- 6951(00)01447-9].