The as-deposited Au/Ti/p-diamond contacts prepared by rf sputtering are ohm
ic. The ohmic characteristics of the contacts are improved after annealing.
As for the as-deposited and annealed contacts, the specific contact resist
ivities of 2.886 x 10(-3) and 2.040 x 10(-4) Omega .cm(2) are obtained, res
pectively The x-ray photoelectron spectroscopy analysis indicates that the
titanium carbide formation occurs at the interface between titanium and the
diamond substrate in the as-deposited state, and no TiO2 is observed.