High-energy resolution mu-XRF analysis by position sensitive spectrometer

With a high-energy resolution micro-X-ray fluorescence (mu -XRF) analysis s etup, which basically consists of an X-ray microbeam formed by an X-ray foc using lens combined with an X-ray apparatus and a wavelength dispersive pos ition sensitive spectrometer with a flat crystal (PSS), preliminary results have been obtained. The counting rate of the analyzed element linearly inc reased with the power of X-ray apparatus, and the energy resolution, full w idth of half maximum (FWHM) of K alpha lines of Ti and Cr reached 16.6 and 23.6 eV, respectively. The Cr K beta and Mn K alpha lines in a sample of st ainless steel could clearly be resolved. The above-mentioned results are al so compared with those obtained by synchrotron radiation light microbeam co mbined with the PSS. The facts show that the high-energy resolution element analysis is feasible by using the setup. Moreover, problems for the setup and the ways to resolve them are discussed as well.