Composition and thickness uniformity of chemical vapor deposited barium strontium titanate films on a patterned structure

Step coverage and composition uniformity on a patterned structure were stud ied in the direct liquid injection metallorganic chemical deposition of bar ium strontium titanate film. When Ti(mpd)(tmhd)(2), (mpd is methylpentanedi ol), (tmhd is tetramethylheptanedionate) was used as a titanium source, tit anium incorporation and deposition rate were determined by the surface reac tion when the deposition temperature was lower than 480 degreesC and excess titanium source was used to reach the right composition of the film, espec ially at low deposition temperatures. In this case, the nonuniform distribu tion of Ti on a patterned structure was observed because, inside the trench , the mass-transfer rate became substantially lower. When Ti(dmae)(4) (dmae is dimethylaminoethoxide) was used, the deposition rate and Ti incorporati on were determined by mass transfer and the Ti incorporation was uniform on the patterned surface. (C) 2000 The Electrochemical Society. S1099-0062(00 )06-109-5. All rights reserved.