Influence of the texture of woven materials on their etching rate in oxygen plasma

Authors
Kuvaldina, EV Rybkin, VV Titov, VA Ivanov, AN
Citation
Ev. Kuvaldina et al., Influence of the texture of woven materials on their etching rate in oxygen plasma, HIGH ENERG, 34(6), 2000, pp. 398-401
Citations number
12
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
HIGH ENERGY CHEMISTRY
ISSN journal
00181439 → ACNP
Volume
34
Issue
6
Year of publication
2000
Pages
398 - 401
Database
ISI
SICI code
0018-1439(200011/12)34:6<398:IOTTOW>2.0.ZU;2-L
Abstract
The oxygen glow-discharge plasma treatment of a poly(ethylene terephthalate ) film and fabric differing in their specific surface area was studied. The rates of mass loss, oxygen uptake, and gas evolution were measured over th e discharge current and pressure ranges 20-110 mA and 50-200 Pa, respective ly, at a sample temperature of 357 K. The specific etching and product form ation rates calculated with accounting for the total surface area of fabric samples were shown to be not affected by the texture of studied materials.