Conductance switching and electrical breakdown of Yb2O3 films in silicon-substrate MIS structures: A comparative study by scanning-probe microscopy

Citation
Vb. Baiburin et al., Conductance switching and electrical breakdown of Yb2O3 films in silicon-substrate MIS structures: A comparative study by scanning-probe microscopy, J COMMUN T, 45(11), 2000, pp. 1234-1236
Citations number
7
Categorie Soggetti
Information Tecnology & Communication Systems
Journal title
JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS
ISSN journal
10642269 → ACNP
Volume
45
Issue
11
Year of publication
2000
Pages
1234 - 1236
Database
ISI
SICI code
1064-2269(200011)45:11<1234:CSAEBO>2.0.ZU;2-T
Abstract
Experimental results that verify the formation of a conducting microchannel ill Yb2O3 films under the transition to the low-resistivity state are repo rted. The films are part of MIS structures fabricated on silicon substrates . The conductance switching is compared with the electrical breakdown of th e films in terms of film relief and microchannel shape. It is found that th e microchannel has a finite lifetime, similar to2-5 min, due to the oxidati on of the material.