The current-voltage characteristics of Si/SiO2 superlattices are numericall
y computed as a function of a number of physical parameters such as the num
ber of Si wells, the Si and SiO2 film thickness, the temperature, etc. It i
s assumed that the Si layers form two-dimensional systems, communicating to
one another through tunnel SiO2 barriers, without quantum coherence betwee
n one Si well and its next nearest neighbours. From the numerical results,
we derive a number of simple conclusions regarding the optimization of such
confined structures, in view of maximizing their electroluminescence effic
iency.