Electrical modelling of Si/SiO2 superlattices

Citation
T. Ouisse et al., Electrical modelling of Si/SiO2 superlattices, J PHYS D, 33(21), 2000, pp. 2691-2698
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN journal
00223727 → ACNP
Volume
33
Issue
21
Year of publication
2000
Pages
2691 - 2698
Database
ISI
SICI code
0022-3727(20001107)33:21<2691:EMOSS>2.0.ZU;2-P
Abstract
The current-voltage characteristics of Si/SiO2 superlattices are numericall y computed as a function of a number of physical parameters such as the num ber of Si wells, the Si and SiO2 film thickness, the temperature, etc. It i s assumed that the Si layers form two-dimensional systems, communicating to one another through tunnel SiO2 barriers, without quantum coherence betwee n one Si well and its next nearest neighbours. From the numerical results, we derive a number of simple conclusions regarding the optimization of such confined structures, in view of maximizing their electroluminescence effic iency.