Tf. Otero et al., A combined scanning tunneling microscopy and electrochemical study of copper electrodeposition from a cyanide solution on a zinc alloy, J ELCHEM SO, 147(12), 2000, pp. 4546-4553
The electrodeposition of Cu on zinc alloy diecast from a cyanide bath was s
tudied using electrochemical techniques and scanning tunneling microscopy (
STM) imaging. As the current density ii) is changed from 1 to 30 mA cm(-2),
the root mean square roughness of the deposit (xi) first increases, reachi
ng a maximum value at j = 10 mA cm(-2), and then decreases. This behavior i
s explained by the strong interference of the hydrogen evolution reaction a
t the highest current densities. The dynamic scaling theory applied to the
STM images for the advanced stages of Cu electrodeposition obtained at j =
10 mA cm(-2) leads to a roughness exponent a = 0.80 and growth exponent bet
a > 0.5 consistent with an unstable interface evolution. The addition of so
dium selenite promotes a leveling effect by hindering the growth of instabi
lities, leading to an interface evolution consistent with the predictions o
f thr Edwards-Wilkinson growth model. (C) 2000 The Electrochemical Society.
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