The surface loss coefficients of CFx (x = 1 - 3) and F radicals have been m
easured on the stainless steel walls of the differential pumping systems of
a plasma reactor. This measurement is made by comparing the beam to backgr
ound signal ratio of the radicals measured by appearance potential mass spe
ctrometry. The surface loss of the radicals in the differential pumping sta
ges of the vacuum system, in addition to the pumping of the species due to
the vacuum Dump, increases the beam to background signal ratio of the radic
al species. The measured loss coefficients are found to be lower than those
reported on surfaces that have been exposed to fluorocarbon plasmas. This
suggests that the loss coefficients of the species are dependent on the sur
face coverage of the radicals (CFx and F), which are lower on the walls in
the differential pumping system. The measured loss coefficients in the diff
erential pumping system are an order of magnitude lower than the loss coeff
icients measured in the afterglow of plasma chambers reported in the litera
ture. We suggest the difference in the loss coefficients of radicals in the
plasma chamber and those measured in this work are due to the differences
in surface coverage in the two cases. (C) 2000 American Vacuum Society. [S0
734-2101(00)00806-X].