Effects of BCl3 addition on Ar/Cl-2 gas in inductively coupled plasmas forlead zirconate titanate etching (vol 18, pg 1373, 2000)

Authors
An, TH Park, JY Yeom, GY Chang, EG Kim, CI
Citation
Th. An et al., Effects of BCl3 addition on Ar/Cl-2 gas in inductively coupled plasmas forlead zirconate titanate etching (vol 18, pg 1373, 2000), J VAC SCI A, 18(6), 2000, pp. 3012-3013
Citations number
1
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
18
Issue
6
Year of publication
2000
Pages
3012 - 3013
Database
ISI
SICI code
0734-2101(200011/12)18:6<3012:EOBAOA>2.0.ZU;2-U