A filtered are evaporation system was used in the deposition of microd
roplet-free TiN films. It was created within a conventional bell jar v
acuum system using a magnetic-field steered are and a plasma duct form
ed from a free standing and isolated high current solenoid. The films
were reactively deposited onto glass substrates by are evaporation of
titanium in a nitrogen/argon atmosphere. The TiN films examined by sca
nning electron microscopy, showed a fine structure, with a small grain
size of 20-30 nm. The optical properties for thin films showed good s
electivity in their spectral reflectance. X-ray diffraction showed a s
trong alignment of the [111] direction parallel to the film surface. (
C) 1997 Elsevier Science S.A.