STRUCTURE AND PROPERTIES OF TI-C-B COMPOSITE THIN-FILMS PRODUCED BY SPUTTERING OF COMPOSITE TIC-TIB2 TARGETS

This work demonstrates the use of self propagating high temperature sy nthesis (SHS) for the production of dense, TiC-TiB2 composite targets for magnetron sputtering of Ti-C-B composite thin films. The measured electrical resistance data of the composite thin films produced from t he TiC-TiB2 composite targets are presented and the microstructures of the composite thin films are characterized. Films with the compositio n 60%TiC +40%TiB2 were the most thermally stable. However, there was n oticeable oxidation when these composite thin films were heated in air at temperatures above 400 degrees C. Heat treatment of the films in v acuum indicated that recrystallization began at approximately 40 degre es C. The absolute value of the temperature coefficient of resistivity decreased noticeably with increase in annealing temperature, reaching a value of -2 x 10(-5) K-1 at 600 degrees C. (C) 1997 Elsevier Scienc e S.A.