High-resolution lenses for sub-100 nm x-ray fluorescence microscopy

Citation
C. David et al., High-resolution lenses for sub-100 nm x-ray fluorescence microscopy, APPL PHYS L, 77(23), 2000, pp. 3851-3853
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
23
Year of publication
2000
Pages
3851 - 3853
Database
ISI
SICI code
0003-6951(200012)77:23<3851:HLFSNX>2.0.ZU;2-#
Abstract
We report on the design, fabrication, and testing of Fresnel zone plates fo r high-resolution x-ray fluorescence microscopy using the scanning x-ray mi croscope at the European Synchrotron Radiation Source. The germanium lenses were optimized for operation near the sulphur absorption edge at 2472 eV p hoton energy. The high measured diffraction efficiencies of up to 9.6% and the good match to the spatial coherence of the undulator beam resulted in a photon flux of about 4x10(8) photons per second within the bandwidth of a silicon < 111 > monochromator. Using a test object consisting of zinc sulph ide nanostructures, we were able to image features in sulphur x-ray fluores cence mode with lateral dimensions down to below 100 nm. (C) 2000 American Institute of Physics. [S0003-6951(00)01149-9].