Application of ONIOM to cluster modeling of the metal surface

Authors
Citation
Hr. Tang et Kn. Fan, Application of ONIOM to cluster modeling of the metal surface, CHEM P LETT, 330(5-6), 2000, pp. 509-514
Citations number
25
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CHEMICAL PHYSICS LETTERS
ISSN journal
00092614 → ACNP
Volume
330
Issue
5-6
Year of publication
2000
Pages
509 - 514
Database
ISI
SICI code
0009-2614(20001117)330:5-6<509:AOOTCM>2.0.ZU;2-X
Abstract
The applicability and reliability of the ONIOM framework in modeling metal surface were first examined in the present study. Both two- and three-layer ONIOM methodology are found economical and reliable. The first nearest coo rdinate metal atoms of those forming adsorption sites, which play a key rol e in determining the adsorption energies, are required to be described by a n accurate high level method, while a low level method can be applied to th e second nearest neighbor or farther atoms. (C) 2000 Elsevier Science B.V. All rights reserved.